Auger electron spectrometer

Equipment model
Phi 700 Xi
Made in
USA, Japan
Use for

Equipment is designated for the Auger electron spectroscopy and Auger electron microscopy analysis of sample surfaces, nanometric particles at the surface and other nanometric features including interface between thin films and their substrate.

Technical parameters
  • Primary electron source: Schottky field emission: (i) accelerating voltage: from 1 up to 25 kV; (ii) beam current: from 0 up to 20 nA;
  • Auger energy resolution: from 0,5 % up to 0,1 % ΔE/E ;
  • Auger spatial resolution: < 8 nm, at 1 nA beam current, 20 kV Vacc and 10° sample tilt;
  • Auger spectral resolution: > 700 kcps at 10 nA, 10 kV, 0,5% ΔE/E, electron beam having  ≤ 30° incidence angle with surface normal, on clean cupper;
  • Auger signal to noise ratio: > 700:1, at 10 nA, 10 kV, 0,5% ΔE/E, electron beam having  ≤ 30° incidence angle with surface normal, on clean cupper;
  • Ion gun current density up to: > 10 µA and > 3 mA/cm2, at 5 kV;
  • Ion gun charge neutralisation for dielectrics: > 10 nA, at 10 eV;
  • Base vacuum pressure: <6,7 × 10-8 Pa (< 5 × 10-10 Torr);
  • Auger kinetic energy analysis range: from not less than 50 eV up to 5600 eV for top surface and deeper Auger analysis.
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