Microscope is designated for the optical investigation of magnified (up to 1000x) objects which are not visible with eye.
Equipment is used for the non-destructive analysis of all types of samples including powders and thin films.
Surface structure and morphology analysis (together wit EDS elemental analysis) of conductive, semi conductive and non conductive samples.
Equipment is designed for measurement of nitrogen, oxygen, and hydrogen amount in a wide variety of metals and other inorganic materials, employing the inert gas fusion principle. Also equipment has possibility to determine gas release from surface contaminated sample which is achieved by pre-treatment of sample with various gas mixtures prepared by special gas premixer.
Bulk elemental analysis of metals, alloys and other substances and for qualitative and quantitative depth profiling of thin film/layer systems with conductive and non-conductive layers, and for detecting changes in chemical composition of sample surface compared to the subsurface material.
Equipment is designated for the XPS analysis of various samples (including thin films and nanopowders) for the determination of elemental and chemical composition.
Equipment is designated for the Auger electron spectroscopy and Auger electron microscopy analysis of sample surfaces, nanometric particles at the surface and other nanometric features including interface between thin films and their substrate.
Microscope is designated for the optical investigation of magnified (up to 1000x) objects which are not visible with eye.
Equipment is used for the non-destructive analysis of all types of samples including powders and thin films.
Surface structure and morphology analysis (together wit EDS elemental analysis) of conductive, semi conductive and non conductive samples.
Equipment is designed for measurement of nitrogen, oxygen, and hydrogen amount in a wide variety of metals and other inorganic materials, employing the inert gas fusion principle. Also equipment has possibility to determine gas release from surface contaminated sample which is achieved by pre-treatment of sample with various gas mixtures prepared by special gas premixer.
Bulk elemental analysis of metals, alloys and other substances and for qualitative and quantitative depth profiling of thin film/layer systems with conductive and non-conductive layers, and for detecting changes in chemical composition of sample surface compared to the subsurface material.
Equipment is designated for the XPS analysis of various samples (including thin films and nanopowders) for the determination of elemental and chemical composition.
Equipment is designated for the Auger electron spectroscopy and Auger electron microscopy analysis of sample surfaces, nanometric particles at the surface and other nanometric features including interface between thin films and their substrate.
